Wide-Wavelength InGaAs/InP PIN Photodiodes Sensitive from 0.7 to 1.6 $\mu$m
スポンサーリンク
概要
- 論文の詳細を見る
We have developed, for the first time, a wide-wavelength InGaAs/InP PIN photodiode for optical communication systems from 0.7- to 1.6-$\mu$m wavelength. The diode has a planar structure with an InP/InGaAs/InP double-hetero epitaxial wafer grown by chloride VPE. To obtain a highsensitivity to 0.7-$\mu$m wavelength light, we introduced a very thin InP cap layer (0.06 $\mu$m) and a shallow pn junction (0.27$\mu$m). Using this structure, we obtained a quantum efficiency of 76% for 0.78-$\mu$m light and 81% for 1.3-$\mu$m light. Dark current and capacitance are only 30 pA and 0.53 pF at 5 V. The frequency response is flat up to 1 GHz above 5 V at 0.78 $\mu$m.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-10-20
著者
-
KAGAWA Shuzo
Fujitsu Laboratories Limited
-
Takada Yuji
Fujitsu Limited, 1015 Nakahara, Kawasaki, Kanagawa 211
-
Ogawa Isao
Fujitsu Limited, 1015 Nakahara, Kawasaki, Kanagawa 211
-
Inoue Kouichi
Fujitsu Limited, 1015 Nakahara, Kawasaki, Kanagawa 211
-
Shibata Tomohiro
Fujitsu Limited, 1015 Nakahara, Kawasaki, Kanagawa 211
関連論文
- Chemical Etching of Germanium with H_3PO_4-H_2O_2-H_2O Solution
- Wide-Wavelength InGaAs/InP PIN Photodiodes Sensitive from 0.7 to 1.6 $\mu$m