Formation of $\beta$-C3N4 Nanocrystals in Ti-Doped Carbon Nitride Films Prepared by Cathode Arc-Assisted Middle-Frequency Magnetron Sputtering

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概要

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• Ti-doped carbon nitride thin films have been deposited by cosputtering Ti and graphite targets in a mixed plasma of Ar and N. Transmission electron microscopy revealed that the nucleation of $\beta$-C3N4 could be promoted by Ti incorporation. The N content of the films was found to strongly depend on Ti concentration, even a small amount of Ti incorporation resulted in a drastic increase in N content. An evolution from amorphous layers with fine mixtures of C, N, and Ti to matrices embedded with $\beta$-C3N4 nanocrystals was observed with increasing bias voltage.

• 2006-06-25

著者

• Yang Bing

  Accelerator Laboratory School Of Physics Wuhan University

• Fan Xiangjun

  Accelerator Laboratory School Of Physics Wuhan University

• Huang Zhihong

  Accelerator Laboratory School Of Physics Wuhan University

• Fu Dejun

  Accelerator Laboratory School Of Physics Wuhan University

• Yang Bing

  Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072, China

• Fu Dejun

  Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072, China

• Fan Xiangjun

  Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072, China

関連論文

• Formation of β-C_3N_4 Nanocrystals in Ti-Doped Carbon Nitride Films Prepared by Cathode Arc-Assisted Middle-Frequency Magnetron Sputtering
• Ti-Containing Amorphous Carbon Nanocomposite Coatings Prepared by Means of Eight-Target Arc-Assisted Middle Frequency Magnetron Sputtering
• Formation of $\beta$-C3N4 Nanocrystals in Ti-Doped Carbon Nitride Films Prepared by Cathode Arc-Assisted Middle-Frequency Magnetron Sputtering
• Ti-Containing Amorphous Carbon Nanocomposite Coatings Prepared by Means of Eight-Target Arc-Assisted Middle Frequency Magnetron Sputtering

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