Ti-Containing Amorphous Carbon Nanocomposite Coatings Prepared by Means of Eight-Target Arc-Assisted Middle Frequency Magnetron Sputtering
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概要
- 論文の詳細を見る
Ti-containing amorphous carbon nanocomposite coatings were deposited by using a modified closed field twin unbalanced magnetron sputtering system which is arc assisted and consists of two circles of targets, in an Ar ambient and at a substrate temperature of 100°C High-resolution transmission electron microscopy shows that the coatings contain Ti nanocrystals embedded in the amorphous carbon matrix. Mechanical and tribological properties of the coatings are influenced by the substrate bias voltage and Ti pair-target current. For coatings prepared at a bias of 100 V, the hardness increases from 12 GPa at a Ti-target current of 4 A to 27 GPa at 15 A. The coating at 4 A exhibits very low friction coefficient ($\sim$0.07) and excellent tribological performance with a wear rate of about $1.4\times 10^{-16}$ m3 N-1 m-1.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2005-07-10
著者
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Yang Bing
Accelerator Laboratory School Of Physics Wuhan University
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Fan Xiangjun
Accelerator Laboratory School Of Physics Wuhan University
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Zeng Zhaoyuan
Wuhan University Honor Advanced Materials Co. Ltd
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Huang Zhihong
Accelerator Laboratory School Of Physics Wuhan University
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Liu Chuansheng
Accelerator Laboratory Department Of Physics Wuhan University
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Fu Dejun
Accelerator Laboratory School Of Physics Wuhan University
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Zeng Zhaoyuan
Wuhan University Honor Advanced Materials Co., Ltd, Wuhan 430072, China
関連論文
- Formation of β-C_3N_4 Nanocrystals in Ti-Doped Carbon Nitride Films Prepared by Cathode Arc-Assisted Middle-Frequency Magnetron Sputtering
- Ti-Containing Amorphous Carbon Nanocomposite Coatings Prepared by Means of Eight-Target Arc-Assisted Middle Frequency Magnetron Sputtering
- Formation of $\beta$-C3N4 Nanocrystals in Ti-Doped Carbon Nitride Films Prepared by Cathode Arc-Assisted Middle-Frequency Magnetron Sputtering
- Ti-Containing Amorphous Carbon Nanocomposite Coatings Prepared by Means of Eight-Target Arc-Assisted Middle Frequency Magnetron Sputtering