Nanoprocessing of Carbon and Boron Nitride Nanoperiod Multilayer Films
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概要
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Carbon and boron nitride nanoperiod multilayer films were deposited. The nanoindentation hardness and modulus of dissipation of the 4-nm-period multilayer film are the highest and the lowest for such films, respectively. The dependence of atomic order processing properties on the load was evaluated. These results indicate that the processing resistance increased at the interface between the carbon and boron nitride layers of multilayer films. By this processing mechanism, nanoprocessing for layer-by-layer removal by mechanical action is performed on nanoperiod multilayer films. The difference in the friction coefficient between each processed material layer can be observed quantitatively.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-03-15
著者
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MIYAKE Shojiro
Nippon Institute of Technology
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KIM Jongduk
Nippon Institute of Technology
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Kim Jongduk
Nippon Institute of Technology, 4-1 Gakuenndai, Miyashiro-machi, Minamisaitama-gun, Saitama 345-8501, Japan
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