MO VPE (Al, Ga)As/GaAs 870 nm Oxide Stripe Lasers with Highly Uniform Laser Characteristics

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概要

論文の詳細を見る
INSTITUTE OF PURE AND APPLIED PHYSICSの論文
1986-06-20

著者

ZSCHAUER K.-H.
Institute of Materials Science VI, University of Erlangen-Nunberg
Wolf H.-D.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Gessner R.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Druminski M.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Kappeler F.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Westermeier H.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Kappeler F.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Druminski M.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Westermeier H.
Research Laboratories, Siemens AG, Otto-Hahn-Ring 6, D-8000 München 83, FRG
Zschauer K.-H.
Institute of Materials Science VI, University of Erlangen-Nürnberg, Martensstr. 7, D-8520 Erlangen, FRG

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