Block Copolymers for DSA in the 100 Å Regime
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概要
- 論文の詳細を見る
Block copolymers with lines and spaces in the 100 Å regime have been oriented using a perfectly neutral top coat and bottom coat and these structures have been successfully developed with RIE to provide high aspect ratio topographic features. Under these conditions, the materials can be annealed in less than 60 seconds. Future work will be directed toward continued increases in χ and development of simple and efficient processes for orienting these structures.
- The Society of Photopolymer Science and Technology (SPST)の論文
著者
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Hayes Colin
Department of Chemistry, The University of Texas at Austin
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Lane Austin
McKetta Department of Chemical Engineering, The University of Texas at Austin
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Maher Michael
Department of Chemistry, The University of Texas at Austin
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Maher Michael
Department of Chemistry, The University of Texas
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Willson C.
Department of Chemistry, The University of Texas at Austin
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Blachut Gregory
McKetta Department of Chemical Engineering, The University of Texas at Austin
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Durand William
McKetta Department of Chemical Engineering, The University of Texas at Austin
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Bates Christopher
Department of Chemistry, The University of Texas at Austin
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Carlson Matthew
McKetta Department of Chemical Engineering, The University of Texas at Austin
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Self Jeffrey
McKetta Department of Chemical Engineering, The University of Texas at Austin
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Asano Yusuke
Department of Chemistry, The University of Texas at Austin
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Sirard Stephen
Lam Research Corp.
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Ellison Christopher
McKetta Department of Chemical Engineering, The University of Texas at Austin