キャピラリー放電を用いたDiamond-Like Carbon薄膜の成膜技術の開発

概要

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The capillary discharge technique has been applied to produce thin film of Diamond-Like Carbon (DLC). In this technique, the deposition is based on an ablation process. In this technique, pulsed electron and plasma beams irradiate the target through the discharge tube and make plume on the target. Ablated particles from the target are deposited as the thin films on the substrate. Until now, this technique has not yet been applied to produce the DLC film. We have tried to apply this technique to grow the DLC films with higher hardness and quality. Graphite disk was used as a target material. We have found that the ablation energy can be controlled by the pinching electron beam in the discharge tube. The C2-Swan-Band of the C2 (dimmer of C), which is believed to the evidence of nucleus formation of nano-particles, was found in the optical emission spectrum of the plume. And the higher energy C+, and C2+ ions, which are species for sp3 bond of diamond formation, were found in the optical emission spectrum of the plume too. Deposition rate of the DLC film showed a linear relationship with the discharge voltage. Hardness of deposited DLC films was measured to be 20-80 GPa. The surface roughness (Ra) of the deposited DLC films was about 0.02 μm. We conclude from the above results that the capillary discharge technique can be one of the superior technique for producing DLC films with high hardness and smooth surface.