High Temperature Sputtered TiO2 Film as an Efficient Blocking Layer for the Dye-sensitized Solar Cells

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概要

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• We investigated the carrier leakage blocking effect of the magnetron sputtered TiO2 film insertion between transparent anodic electrode and porous TiO2 film in the dye-sensitized solar cell (DSC), as a consequence of preventing the ionic short-circuiting of the electrolyte to the anodic electrode through porous TiO2 film. The optimization of the deposition condition of the high temperature TiO2 sputtering for the carrier leakage blocking is reported.

• 公益社団法人 電気化学会の論文

著者

• Hattori Ryo

  Advanced Technology R&d Center Mitsubishi Electric Corp.

• GOTO Hajime

  Ion Engineering Research Institute Corporation

関連論文

• Shuttle Activation Annealing of Implanted Al in 4H-SiC
• Shuttle Activation Annealing of Implanted Al in 4H-SiC
• High Temperature Sputtered TiO2 Film as an Efficient Blocking Layer for the Dye-sensitized Solar Cells

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