Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process
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概要
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The oxidation mechanism of hydrazine and hydroxylamine were investigated using molecular orbital (MO) calculation. Two pathways for their reactions were verified. One is initiated by hydrogen elimination from the reducing agent, followed by coordination of hydroxyl group to center nitrogen atom accompanied with electron emission. Another is initiated by coordination of hydroxyl group to hydrogen atom to form H2O, which is eliminated later, followed by electron emission. The calculated results indicated that the oxidation reactions of hydrazine preferentially proceeded via the second pathway. It was also indicated that only the first electron emission steps of the hydrazine oxidation took place on Cu surface, while the following reactions proceeded at near the solid/liquid interface. The oxidation of hydroxylamine also proceeded via the elimination reaction of H2O. After the oxidation, calculated heats of reactions suggested that OH radical, generated from N2O as a product, decomposed hydroxylamine.
- 公益社団法人 電気化学会の論文
著者
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Nakai Hiromi
Department Of Applied Chemistry Faculty Of Engineering Osaka University
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Homma Takayuki
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Nakai Hiromi
Department of Chemistry, School of Science and Engineering, Waseda University
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SHIMADA Takuya
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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TAMAKI Amiko
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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