Semi-homogeneous joining of silicon nitride using oxynitride glass insert containing silicon nitride powder and post-heat treatment
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概要
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Joining of silicon nitride with a semi-homogenous joint, which had similar composition and microstructure to bulk silicon nitride, was attempted. To make such a joint, oxynitride glass containing silicon nitride powder was used as an insert, joining was processed under low mechanical pressure, and post-heat treatment was performed for a long time at elevated temperatures after joining. The joining was successfully performed, and a semi-homogeneous joint was formed between the silicon nitride bulks. This joined silicon nitride exhibited a high strength of 671 MPa at room temperature owing to the formation of this joint.
- 公益社団法人 日本セラミックス協会の論文
著者
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KITA Hideki
National Institute of Advanced Industrial Science and Technology (AIST)
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KONDO Naoki
National Institute of Advanced Industrial Science and Technology (AIST)
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HYUGA Hideki
National Institute of Advanced Industrial Science and Technology (AIST)
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Hyuga Hideki
National Institute Of Advanced Industrial Science & Technology Aist
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Kondo Naoki
National Industrial Research Institute Of Nagoya
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HOTTA Mikinori
National Institute of Advanced Industrial Science and Technology (AIST)
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Kita Hideki
National Inst. Of Advanced Industrial Sci. And Technol. (aist)
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