The Solvent Effect on the Reaction Selectivity in the Chlorination of Propionic Acid
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概要
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The chlorinations of propionic acid with chlorine were carried out at 70°C in various solvent mixtures with photo-irradiation or with initiation by benzoyl peroxide. Benzene - CCl<SUB>4</SUB>, naphthalene - CCl<SUB>4</SUB>, and anthracene -CCl<SUB>4</SUB> mixtures, and sulfur dioxide - CCl<SUB>4</SUB> were used as the solvents. In the benzene - CCl<SUB>4</SUB> mixtures, the relative reactivity, β/α, of the a and the α positions of propionic acid changed from 1.68 (CCl<SUB>4</SUB>) to 1.11 (benzene), the ratio being inversely proportional to the electron-donor properties of the solvents. In the naphthalene -CCl<SUB>4</SUB> mixtures, the plot of the relative reactivity, β/α, <I>versus</I> the naphthalene content showed a minimun at <I>ca.</I> 0.1 mol/<I>l</I> of naphthalene; however, the total yield of the chlorinated acids decreased as the content of the naphthalene increased. No chlorinated acids were obtained in the anthracene - CCl<SUB>4</SUB> system. In the presence of sulfur dioxide, the α-position was more readily substituted than the β-position, the β/α ratio decreasing as the molar ratios of C1<SUB>2</SUB>/SO<SUB>2</SUB> were decreased, from 1.3 (Cl<SUB>2</SUB>/SO<SUB>2</SUB>=0.286/0.036) to 0.49 (0.286/0.858), by the initiation of benzoyl peroxide. However, dilution with CCl<SUB>4</SUB> or photo-irradiated chlorination cause no change in the selectivity in spite of the presence of sulfur dioxide. A mechanism to account for such a selectivity has been suggested.
- 公益社団法人 日本化学会の論文
著者
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Tokura Niichiro
Department of Applied Chemistry, Faculty of Engineering, Osaka University
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Ryang Hon
Department of Applied Chemistry, Faculty of Engineering, Osaka University
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Horikawa Yukio
Department of Applied Chemistry, Faculty of Engineering, Osaka University
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Nagai Toshikazu
Department of Applied Chemistry, Faculty of Engineering, Osaka University
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