High-Throughput UV Nanoimprint Process Using Flexible Resin Mold for High-Brightness Light-Emitting Diodes (特集 MEMSパッケージングと微細加工技術)
スポンサーリンク
概要
- 論文の詳細を見る
This paper demonstrated a high-throughput fabrication process of resin mold and nanostructures for high-brightness light-emitting diodes (LED). The fabrication process includes roll-to-roll (RtR) UV imprinting for resin mold fabrication and perpendicular UV imprinting on wafers. The measurement results of pattern sizes in UV imprinted sample indicate that the resin mold was uniform enough to use for subsequent UV imprinting, and highly uniform UV imprinting was achieved by means of developed high-throughput UV imprinting equipment. Thickness of the residual layer was highly uniform and repeatable. This fabrication process is expected to be applied to fabricate nanostructures for actual high-brightness LEDs.
- 電気学会の論文
著者
-
Shinohara Hidetoshi
Toshiba Machine Co., Ltd.
-
Tashiro Takaharu
Toshiba Machine Co., Ltd.
-
Ookawa Takafumi
Toshiba Machine Co., Ltd.
-
Nishihara Hiromi
Toshiba Machine Co., Ltd.
関連論文
- High-Throughput UV Nanoimprint Process Using Flexible Resin Mold for High-Brightness Light-Emitting Diodes
- High-Throughput UV Nanoimprint Process Using Flexible Resin Mold for High-Brightness Light-Emitting Diodes (特集 MEMSパッケージングと微細加工技術)