ダイナミックミキシング法により形成したTiN膜の構造と摩耗

概要

論文の詳細を見る
TiN films have been formed by dynamic mixing (DM) process, in which N ions are implanted during Ti evaporation or TiN reactive evaporation under low or high N2 gas pressure. Structure and wear characteristics of the films have been investigated by comparison with TiN films formed by the conventional reactive evaporation process.Rutherford backscattering spectroscopy and electron probe microanalysis showed that the composition ratio (N/Ti) of the TiN films formed by DM process is above 1.5, and that oxygen concentration is lower than in films formed by conventional reactive evaporation. In DM process, the N/Ti ratio of films formed under high N2 gas pressures was slightly larger than that of films formed under low pressures. Transmission electron microscopy showed that the grain of the films produced by DM process were coarser than those of the films formed by reactive evaporation.In a dry reciprocating rubbing test vs SUJ 2 steel, films produced by reactive evaporation were easily worn out and it is thought that the wear resistance of films made by DM process is superior to that of films made by reactive evaporation. With DM process, no matter how N2 gas pressure varies, there are no large differences in the wear characteristics of the films.
社団法人表面技術協会の論文