無電解ニッケル皮膜の微細構造及び電気抵抗に及ぼすニッケル塩水溶液のアニオン種及びpHの影響

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概要

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• Effects of anion species and the pH of Ni salt solution on the microstructure and electric resistivity of an Ni film prepared by an electroless plating method were examined by SEM, XRD, Hg porosimetory, BET surface analyses and resistometory.Because they were made up of uniform microparticles, Ni films prepared from NiSO4 solutions gave the largest specific surface area, the lowest pore radius and the lowest specific resistivity, while those prepared from NiCl2 and Ni(NO3)2 did not give good results due to the fact that their Ni particles were segregated and large, and had low crystallinity.Ni films prepared from a pH 5 solution of NiSO4 gave the largest specific surface area and the lowest specific resistivity, owing to the uniformly grown Ni particles.Ni films prepared from NiSO4 at pH 5 were thought to be the most suitable material for electrodes.

• 社団法人 表面技術協会の論文

著者

• 元根 正晴

  大阪工業技術試験所

関連論文

• 還元剤浸透法による無電解ニッケル皮膜析出速度に及ぼす浴条件の影響
• 無電解ニッケル皮膜の微細構造及び電気抵抗に及ぼすニッケル塩水溶液のアニオン種及びpHの影響

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