三硫化アンチモンのArガス中蒸着

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概要

• 論文の詳細を見る

• Antimony trisulfide was evaporated in Ar gas at low pressure, and the effects of deposition conditions on the physical properties of evaporated films were studied. The deposition parameters such as Ar pressure, evaporation rate, evaporation source temperature, and the distance between a substrate and an evaporation source temperature, exercised a great effect on the properties of evaporated films.<BR>The effects of deposition parameters revealed in this experiment were very different from those observed in the vacuum deposition of antimony trisulfide. This shows the deposition mechanisms in Ar at low pressure are different from the ordinary vacuum deposition mechanisms.<BR>In this paper, those mechanisms are briefly discussed and qualitative explanations are given.

• 日本真空協会の論文

著者

• 三角 明

  日立 茂原工場

• 三角 明

  (株) 日立製作所電子管事業部日立茂原工場

関連論文

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• 三硫化アンチモンのArガス中蒸着
• 三硫化アンチモンの真空蒸着

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