非晶質Gd Tb Fe薄膜における膜組成及び磁化特性のAr圧力依存性

概要

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An influence of Ar pressure on the film composition and the magnetic properties has been investigated for GdTbFe amorphous films prepared by rf sputtering. In the case of soda glass and fused silica substrates, Auger analysis shows that the dissociation of the substrate under electron bomberdment results in the increase of oxygen concentration near the interface. The composition of the film sputtered at 4×10<SUP>-3</SUP> Torr Ar is close to RE/Fe area ratio of the target. With the increase of Ar pressure, the contents of Tb and Fe decrease while that of Gd increases, and the coercive force changes from about 4 kOe to 300 Oe. These results are attributed to the preferential resputterin.g effect and the surface oxidation of the Tb target. Spots of 1 μm in diameter can be written with the laser beam of 3 mW power and 0.25 μsec pulse width on the film prepared at 4×10<SUP>-3</SUP> Torr Ar.
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