A Two-dimensional Anisotropic Wet Etching Simulator for Quartz Crystal
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概要
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We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for users convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.
著者
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Ueda Toshitsugu
The Graduate School Of Information Production And Systems Waseda University
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Zhao Meng
The Graduate School of Information, Production and Systems, Waseda University
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Wang Jiani
The Graduate School of Information, Production and Systems, Waseda University
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Oigawa Hiroshi
The Graduate School of Information, Production and Systems, Waseda University
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Ji Jing
The Graduate School of Information, Production and Systems, Waseda University
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Hayashi Hisanori
The Graduate School of Information, Production and Systems, Waseda University
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