Simple Model for Selective Helium Pumping of Nickel : Temperature Dependence of Helium Retention

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概要

• 論文の詳細を見る
• 北海道大学 = Hokkaido Universityの論文
• 1994-02-21

著者

• Yamashina Toshiro

  Dept. of Nuclear Engineering, Hokkaido Univ

• Yamashina Toshiro

  Dept. Of Nuclear Engineering Hokkaido Univ

• Hino T

  Hokkaido Univ. Sapporo Jpn

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• Model for Deposition of Thin Films in Plasma CVD
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• Reduction of Helium Ash in Fusion Plasma by Selective Helium Pumping
• Simple Model for Selective Helium Pumping of Nickel : Temperature Dependence of Helium Retention

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