Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography

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概要

• 論文の詳細を見る

著者

• Tabata Osamu

  Kyoto Univ. Kyoto Jpn

関連論文

• Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography
• Algorithm to Derive Optimal Mask and Movement Patterns in Moving Mask Deep X-ray Lithography (M^2DXL)
• Fabrication of Plastic Micro Tip Array using Laser Micromachining of Nanoparticles Dispersed Polymer and Micromolding

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