Cubic GaN/AlGaN HEMTs on 3C-SiC Substrate for Normally-Off Operation(GaN-Based Devices,<Special Section>Heterostructure Microelectronics with TWHM2005)

概要

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Phase pure cubic (c-) GaN/AlGaN heterostructures on 3C-SiC free standing (001) substrates have successfully been developed. Almost complete (100%) phase pure c-GaN films are achieved with 2-nm surface roughness on 3C-SiC substrate and stoichiometric growth conditions. The polarization effect in c-GaN/AlGaN has been evaluated, based on measuring the transition energy of GaN/AlGaN quantum wells (QWs). It is demonstrated that the polarization electric fields are negligible small in c-GaN/AlGaN/3C-SiC compared with those of hexagonal (h-)GaN/AlGaN, 710kV/cm for Al content x of 0.15, and 1.4MV/cm for x of 0.25. A sheet carrier concentration of c-GaN/AlGaN heterojunction interface is estimated to 1.6×10^<12>cm^<-2>, one order of magnitude smaller than that of h-GaN/AlGaN. The band diagrams of c-GaN/AlGaN HEMTs have been simulated to demonstrate the normally-off mode operation. The blocking voltage capability of GaN films was demonstrated with C-V measurement of Schottky diode test vehicle, and extrapolated higher than 600V in c-GaN films at a doping level below 5×10^<15>cm^<-3>, to show the possibility for high power electronics applications.
社団法人電子情報通信学会の論文
2006-07-01