Fabrication of 1 Tdots/in^2 Patterned Media with Anodic Alumina Technique

概要

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We investigated the potential of an anodic alumina template for high-density patterned media. Anodic alumina hole density of 1.86 Tdots/in^2 was achieved by suppressing surface roughness by alloying aluminum with Ti and Hf. However, it was difficult to fabricate the embedded type patterned media with a recording layer of thinner than 25 nm in an anodic alumina template of 1.03 Tdots/in^2. This necessitated a switch from an embedding process to a coating process, so we developed a new anodizing process for patterned media of 1 Tdots/in^2. The process formed the niobium oxide pillar structure successfully with high density in an anodic alumina template. 1.03 Tdots/in^2 patterned media fabrication was achieved by depositing the Co_<70>Pt_<30> recording layer on the pillars.
社団法人日本磁気学会の論文
2008-07-01