Effect of Post-Treatments on Atomic Layer Deposition of TiN Thin Films Using Tetrakis(dimethylamido)titanium and Ammonia :Surfaces, Interfaces, and Films
スポンサーリンク
概要
- 論文の詳細を見る
- 2002-04-01
著者
-
Yun Jong-ho
Memory Research & Development Division Hynix Semiconductor Inc.
-
Jang Choel-min
Genitech Inc.
-
Choi Eun-seok
Memory Research & Development Division Hynix Semiconductor Inc.
-
LEE Choon-Soo
Genitech Inc.
関連論文
- Effect of Post-Treatments on Atomic Layer Deposition of TiN Thin Films Using Tetrakis(dimethylamido)titanium and Ammonia :Surfaces, Interfaces, and Films
- Submicron Via-Hole Filling using Al Low-Pressure Seed Process : Surfaces, Interfaces, and Films