Improved Electrochromic Response Time of Nickel Hydroxide Thin Film by Ultra-Thin Nickel Metal Layer : Atoms, Molecules, and Chemical Physics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-07-01
著者
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SUNG Yung-Eun
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST
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Sung Yung-eun
Department Of Materials Science And Engineering And Center For Frontier Materials Kwangju Institute
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JEONG Do
Department of Materials Science and Engineering and Center for Frontier Materials, Kwangju Institute
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KIM Woo-Seong
Department of Materials Science and Engineering and Center for Frontier Materials, Kwangju Institute
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Kim Woo-seong
Department Of Materials Science And Engineering And Center For Frontier Materials Kwangju Institute
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Jeong Do
Department Of Materials Science And Engineering And Center For Frontier Materials Kwangju Institute
関連論文
- The Effect of RF Power on the Electrochromic Response Time of Sputter-Deposited Ni Oxide Films : Atoms, Molecules, and Chemical Physics
- The Effect of Ar/O_2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using an RF Sputtering System : Atoms, Molecules, and Chemical Physics
- Improved Electrochromic Response Time of Nickel Hydroxide Thin Film by Ultra-Thin Nickel Metal Layer : Atoms, Molecules, and Chemical Physics