The Effect of Ar/O_2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using an RF Sputtering System : Atoms, Molecules, and Chemical Physics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-02-15
著者
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Ahn Kwang-soon
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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NAH Yoon-Chae
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST
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SUNG Yung-Eun
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology (K-JIST
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YUM Jun-Ho
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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Nah Yoon-chae
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Yum Jun-ho
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Sung Y‐e
Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology
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Sung Yung-eun
Department Of Materials Science And Engineering And Center For Frontier Materials Kwangju Institute
関連論文
- The Effect of RF Power on the Electrochromic Response Time of Sputter-Deposited Ni Oxide Films : Atoms, Molecules, and Chemical Physics
- The Effect of Ar/O_2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using an RF Sputtering System : Atoms, Molecules, and Chemical Physics
- Improved Electrochromic Response Time of Nickel Hydroxide Thin Film by Ultra-Thin Nickel Metal Layer : Atoms, Molecules, and Chemical Physics