Strong Ultraviolet Photoluminescence in Polycrystalline ZnO Sputtered Films

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概要

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• Polycrystalline ZnO films both exhibiting strong ultraviolet (UV) photoluminescence (PL) and having smooth surfaces applicable to electronic devices have been obtained by if-sputter deposition and subsequent heat treatment. The peak of UV PL was located at 3.05 eV and exhibited a linewidth as narrow as 70 meV, along with a strong intensity comparable to that observed for ZnO epitaxial film grown on sapphire under the same conditions. The UV PL intensity was found to be complementary to that of the red PL emerging at around 2 eV, which is caused by the crystal imperfection of the films along the c-axis. The iacreased film-growth temperature and subsequent heat treatment at low temperatures prominently reduced the red PL, which resulted in the above excellent features of the polycrystalline ZnO films.

• 社団法人応用物理学会の論文
• 2002-09-15

著者

• Ozaki Kenichi

  School Of Materials Science Japan Advanced Institute Of Science And Technology

• Gomi Manabu

  School Of Materials Science Japan Advanced Institute Of Science And Technology

関連論文

• Strong Ultraviolet Photoluminescence in Polycrystalline ZnO Sputtered Films
• Heteroepitaxial Growth of α-Fe_2O_3 Thin Films on (111) GGG
• Photoluminescent and Structural Properties of Precipitated ZnO Fine Particles
• Photoluminescent and Structural Properties of Precipitated ZnO Fine Particles

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