High-Power Compact Laser-Plasma Source for X-ray Lithography

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概要

• 論文の詳細を見る

• A compact laser-produced plasma X-ray source that radiates 1 nm X-rays with an average power of 24W in 2π steradians is presented. The X-ray conversion efficiency is 9% of the laser power delivered on target. The 300 W laser power is generated by a compact diode-pumped, solid-state Nd:YAG laser system. The X-ray source was used to demonstrate X-ray lithography of 75 nm lines. The X-ray source is optimized for integration with an X-ray stepper to provide a complete X-ray lithography exposure tool for the manufacture of high-speed GaAs devices.

• 社団法人応用物理学会の論文
• 2002-06-30

著者

• Smith Henry

  Massachusetts Institute of Technology

• Gaeta Celestino

  Jmar Research Inc.

• Rieger Harry

  Jmar Research Inc.

• Foster Richard

  Jmar Research Inc.

• Hark Peter

  Jmar Research Inc.

• Maldonado Juan

  Jmar Research Inc.

• TURCU I.

  JMAR Research, Inc.

• FORBER Richard

  JMAR Research, Inc.

• CAMPEAU Serge

  JMAR Research, Inc.

• CASSIDY Kelly

  JMAR Research, Inc.

• POWERS Michael

  JMAR Research, Inc.

• FRENCH Gary

  JMAR Research, Inc.

• NAUNGAYAN Joseph

  JMAR Research, Inc.

• KELSEY Charles

  JMAR Research, Inc.

• MORRIS James

  JMAR Research, Inc.

• LIM Michael

  Massachusetts Institute of Technology

• Naungayan Joseph

  Jmar Research Inc.

• Turcu I.

  Jmar Research Inc.

• Campeau Serge

  Jmar Research Inc.

• Cassidy Kelly

  Jmar Research Inc.

• Forber Richard

  Jmar Research Inc.

• French Gary

  Jmar Research Inc.

• Kelsey Charles

  Jmar Research Inc.

• Powers Michael

  Jmar Research Inc.

• Morris James

  Jmar Research Inc.

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• High-Power Compact Laser-Plasma Source for X-ray Lithography
• X-Ray Nanolithography-the Clearest Path to 0.1 and Sub-0.1μm ULSI : X-Ray Lithography

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