Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors
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概要
- 論文の詳細を見る
- 2002-06-30
著者
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BRAUN Stefan
Fraunhofer institut Werksroff-und Strahltechnik
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MAI Hermann
Fraunhofer institut Werksroff-und Strahltechnik
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Moss Matthew
Fraunhofer institut Werksroff-und Strahltechnik
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SCHOLZ Roland
Max-Planck-Institutfiir Mikrostrukrurphysik Halle
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LESON Andreas
Fraunhofer institut Werksroff-und Strahltechnik
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Scholz Roland
Max-planck Institute Of Microstructure Physics
関連論文
- Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors
- Microscopy of SiC Layers Grown by C_ Deposition on Si (100)
- Gate Stack Integration of Germanium Oxynitride for Germanium MOSFETs
- Fabrication and characteristics of Germanium-on-Insulator