Local Structural Relaxation around OH in Silica Glass
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-05-15
著者
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SAITO Kazuya
Research Center for Molecular Thermodynamics, Graduate School of Science, Osaka University
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Saito K
Research Center For Advanced Photon Technology Toyota Technological Institute
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KAKIUCHIDA Hiroshi
Research Center for Advanced Photon Technology, Toyota Technological Institute
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IKUSHIMA Akira
Research Center for Advanced Photon Technology, Toyota Technological Institute
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Saito Kazuya
Research Center For Advanced Photon Technology Toyota Technological Institute
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Ikushima Akira
Research Center For Advanced Photon Technology Toyota Technological Institute
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Kakiuchida Hiroshi
Research Center For Advanced Photon Technology Toyota Technological Institute
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- Effect of Chlorine on Rayleigh Scattering Reduction in Silica Glass
- Rayleigh Scattering in Fluorine-Doped Silica Glass
- Local Structural Relaxation around OH in Silica Glass
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- Induced Defects and Increase of Second-Order Nonlinearity in Ultraviolet-Poled GeO_2-SiO_2 Glass
- Rayleigh Scattering in Fluorine-Doped Silica Glass
- Specific Volume of Fluorine-Doped Silica Glass with Various Fictive Temperatures
- Effect of Chlorine on Rayleigh Scattering Reduction in Silica Glass
- Induced Defects and Increase of Second-Order Nonlinearity in Ultraviolet-Poled GeO2–SiO2 Glass