Induced Defects and Increase of Second-Order Nonlinearity in Ultraviolet-Poled GeO_2-SiO_2 Glass
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-11-15
著者
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Fujiwara Takumi
Research Center For Advanced Photonic Technology (rcapt) Toyota Technological Institute
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Ohama Motoshi
Research Center For Advanced Photonic Technology (rcapt) Toyota Technological Institute
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Ikushima Akira
Research Center For Advanced Photonic Technology (rcapt) Toyota Technological Institute
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Ikushima Akira
Research Center For Advanced Photon Technology Toyota Technological Institute
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Ohama Motoshi
Research and Development Center, Tsuchiya Co., Ltd., 22-4 Higashinamikikitayama-machi, Chiryu, Aichi 472-0006, Japan
関連論文
- Local Structural Relaxation around OH in Silica Glass
- Light-Emitting Seal Using Self-Aligned Organic Light-Emitting Structure
- Refractive Index, Density and Polarizability of Silica Glass with Various Fictive Temperatures
- Induced Defects and Increase of Second-Order Nonlinearity in Ultraviolet-Poled GeO_2-SiO_2 Glass
- Rayleigh Scattering in Fluorine-Doped Silica Glass
- Specific Volume of Fluorine-Doped Silica Glass with Various Fictive Temperatures
- Effect of Chlorine on Rayleigh Scattering Reduction in Silica Glass
- Induced Defects and Increase of Second-Order Nonlinearity in Ultraviolet-Poled GeO2–SiO2 Glass