Metalorganic Chemical Vapor Deposition of Copper Using (Hexafluoroacetylacetonate)Cu^<(1)>(3,3-dimethyl-1-butene) with a Liquid Delivery System
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-05-15
著者
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Choi Kyeong-keun
Laboratory For Advanced Molecular Processing Department Of Chemical Engineering. Pohang University O
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RHEE Shi-Woo
Laboratory for Advanced Materials Processing (LAMP), Department of Chemical Engineering, Pohang Univ
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Rhee Shi-woo
Laboratory For Advanced Molecular Processing Department Of Chemical Engineering. Pohang University O
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PYO Sung
System IC R&D Center, Hynix Semiconductor Co., Ltd.
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LEE Dok
System IC R&D Center, Hynix Semiconductor Co., Ltd.
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Rhee Shi-woo
Laboratory For Advanced Materials Processing (lamp) Department Of Chemical Engineering Pohang Univer
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Lee Dok
System Ic R&d Center Hynix Semiconductor Co. Ltd.
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Pyo Sung
System Ic R&d Center Hynix Semiconductor Co. Ltd.
関連論文
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- Metalorganic Chemical Vapor Deposition of Copper Using (Hexafluoroacetylacetonate)Cu^(3,3-dimethyl-1-butene) with a Liquid Delivery System