Projected Range, Range Straggling and Lateral Spread of 2.0 MeV Au^+ Ions Implanted into Si
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-02-15
著者
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NARUSAWA Tadashi
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology
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Wang K‐m
Shandong Univ. Shandong Chn
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Wang Ke-ming
Department Of Physics Shandong University
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Chen F
Shandong Univ. Shandong Chn
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Chen Feng
Department Of Physics Shandong University
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Chen Feng
State Key Laboratory Of Structural Chemistry Fujian Institute Of Research On The Structure Of Matter
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Zhang Jian-hua
Department Of Physics Shandong University
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Hu Hui
Department Of Physics Shandong University
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Hu Hui
Department Of Aerospace Engineering Iowa State University
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ZHANG Jiang-Hua
Department of Physics, Shandong University
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LlU Xiang-Dong
Department of Physics, Shandong University
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SHEN Ding-Yu
Department of Technique Physics & the Key Laboratory of Heavy Ion Physics, Ministry of Education, Pe
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NAGAKI Masakane
Department of Electronic and Photonic System Engineering, Faculty of Engineering, Kochi University o
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Chen Feng
Department Of Applied Physics And Chemistry The University Of Electro-communications
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Narusawa Tadashi
Department Of Electronic And Photonic System Engineering Faculty Of Engineering Kochi University Of
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Shen Ding-yu
Department Of Technique Physics & The Key Laboratory Of Heavy Ion Physics Ministry Of Education
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Llu Xiang-dong
Department Of Physics Shandong University
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Nagaki Masakane
Department Of Electronic And Photonic System Engineering Faculty Of Engineering Kochi University Of
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Chen F
State Key Laboratory Of Structural Chemistry Fujian Institute Of Research On The Structure Of Matter
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