Effect of Purge Gas on the Reliability of a 266nm Continuous-Wave Solid-State Laser(Lasers, Quantum Electronics)
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概要
- 論文の詳細を見る
The reliability of a 266 nm cw (continuous-wave) solid-state laser under the influence of purge gas was considered. Scatterers on a mirror during long-term operation were ammonium sulfate (NH_4SO_4). The synthesis of ammonium sulfate was related to the amount of water in the purge gas. UV power decreased by scatterers when the purge was not conducted.
- 社団法人電子情報通信学会の論文
- 2004-12-01
著者
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Kubota Shigeo
Sony Co.
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Wada Hiroyuki
Sony Co.
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Oka Michio
Sony Co.
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Tatsuki K
Sony Co.
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TATSUKI Koichi
SONY Co.
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SAITO Masaki
SONY Co.
関連論文
- Effect of Purge Gas on the Reliability of a 266nm Continuous-Wave Solid-State Laser(Lasers, Quantum Electronics)
- Performance and Reliability Improvement of HfSiON Field-Effect Transistor with Low Hafnium Concentration Cap Layer Formed by Metal Organic Chemical Vapor Deposition with Diethylsilane
- Measurement and Analysis of Cavity Loss of a 266 nm Continuous-Wave Solid-State Laser