DPM錯体を原料とするLiNbO_3薄膜のCVD

概要

論文の詳細を見る
Characteristics of a Low Pressure Metal Organic Chemical Vapor Deposition of Lithium niobate (LiNbO_3) was investigated by experiments and also by a model simulation. The source material used were β-diketonate complexes of lithium and niobium (Li(DPM) and Nb(DPM)_2 Cl_3, respectively). Operation pressure was 0.66kPa, temperature was between 873 and 1023K, oxygen molar fraction of the inlet gas was 0.50. The experimental results showed that there is a rather narrow range of temperature and feed gas composition which allows CVD growth of pure LiNbO_3 thin film. We proposed a map on temperature vs. inlet lithium composition plane which indicate the composition of grown films. If the growth conditions are set in the proper region, we can grow pure LiNbO_3 film throughout the reactor tube. Growth rate and solid composition distributions were compared with a simple CVD simulation model, which successfully explains the CVD characteristics of solid mixtures such as Yttria Stabilized Zirconia(YSZ). The simple model failed to explain the LiNbO_3 CVD. This suggest there would be a possible aduct formation in gas phase and/or significant change of surface reaction rates between single component CVD and multi-component CVD systems.
九州大学の論文
1997-07-25