Li(DPM)を原料とするLi_2OあるいはLi_2CO_3薄膜の減圧MOCVD

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概要

• 論文の詳細を見る

• Low pressure metal organic chemical vapor deposition (LPMOCVD) of Li_2O solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere is experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analyses revealed that Li_2CO_3 film grows in nitrogen-oxygen atmosphere and Li_2O grows in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacts with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well known micro trench method and Monte Carlo simulation was not fully successful, but set of data on gas phase reaction rate constant and surface reaction constant was obtained.

• 九州大学の論文
• 1997-07-25

著者

• 鄭 相鐵

  L.g.半導体(株)

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