The study on the diffusion and secondary-defect-formation of point defects during the growth process of silicon single-crystal(Abstracts of Doctoral Dissertations,Annual Report(from April 2001 to March 2002))

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概要

• 論文の詳細を見る
• 東北大学の論文
• 2002-12-20

著者

• Nakamura Kozo

  Technical Division Komatsu Electronic Metals Co. Ltd.

関連論文

• The study on the diffusion and secondary-defect-formation of point defects during the growth process of silicon single-crystal(Abstracts of Doctoral Dissertations,Annual Report(from April 2001 to March 2002))

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