Orientation of Poly (di-hexyl silane) Thin Films(Evaluation of organic materials)
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概要
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Poly (di-hexyl silane) thin films are prepared by casting the solution onto (100) Si substrates, and the structure of the films obtained is examined by the X-ray diffraction method. As a result, it is found that the strength of the diffraction peaks from (010), (110), (020), and (220) planes is strong, whereas that of the diffraction peaks from (100) and (200) planes is weak. The reason is discussed on the bases of the molecular structure and packing of poly (di-hexyl silane).
- 社団法人電子情報通信学会の論文
- 2006-05-11
著者
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Arakawa Hitoshi
Graduate School Of Computer Science And Systems Engineering Kyushu Institute Of Technology
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Furukawa Shoji
Graduate School Of Computer Science And Systems Engineering Kyushu Institute Of Technology
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Ohta Hidetaka
Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology
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Ohta Hidetaka
Graduate School Of Computer Science And Systems Engineering Kyushu Institute Of Technology
関連論文
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