The Deposition Rate of Arsenic by the Hydrogen Reduction of Arsenic (III) Chloride

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概要

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• The hydrogen reduction of arsenic (III) chloride has been examined under different conditions. The reduction was carried out in gas phase, and the manometric measurement showed that the reaction in gas phase did not proceed below 450℃. Arsenic was deposited on a substrate heated in the flow of the mixed gas composed of arsenic (III) chloride and a large excess of hydrogen, and its deposition rate was measured. The activation energy of arsenic deposition was found to be 22.3 kcal/mol (298〜370℃), when the rate-determining step was the chemical reaction proceeding on the surface of previously deposited arsenic.

• 東北大学の論文

著者

• Kagawa Masahiro

  The Research Institute for Iron, Steel and Other Metals, Tohoku University

• Kagawa Masahiro

  The Research Institute For Iron Steel And Other Metals

• HASUMI Takashi

  Furukawa Denki Kogyo Inc.

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