Low Temperature Growth of Polycrystalline Silicon Films by Hot- Wire Chemical Vapor Deposition Using SiCl_4/H_2 Gases : Semiconductors

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-11-15

著者

• Wong Te-chi

  Department Of Chemical Engineering National Cheng Kung University

• Wu Jih-jen

  Department Of Chemical Engineering National Cheng Kung University

関連論文

• Low Temperature Growth of Polycrystalline Silicon Films by Hot- Wire Chemical Vapor Deposition Using SiCl_4/H_2 Gases : Semiconductors
• Spectral and Spatial Luminescence Distribution of m-Plane ZnO Epitaxial Films Containing Stacking Faults: A Cathodoluminescence Study

スポンサーリンク