インクジェット法による高分子超薄膜の位置選択的形成(オーガナイズドセッション4 材料創成プロセスと熱工学)

概要

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Site-selective deposition of polymer thin film on well-defined patterned self-assembled monolayers has been paid great attention these days. The purpose of this study is to establish the fundamental technology of site-selective deposition of polymer thin film utilizing wetting contrast of patterned fluoroalkylsilane monolayer (R_f)/silanol(Si-OH) surfaces. R_f/Si-OH patterned surface (line, square) prepared by the VUV-rays or EB lithography have liquidphobic R_f and liquidphilic Si-OH phases, respectively. Polystyrene xylene solution was deposited on the patterned surface with wetting contrast by ink-jet method. The patterned polystyrene ultrathin films were selectively formed on liquidphilic areas.
一般社団法人日本機械学会の論文
2004-11-10