Characteristics of a Modified High Frequency Ion Source
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1981-09-05
著者
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Yamashita Mutsuo
Department Of Electronics Faculty Of Engineering Osaka Electro-communication University
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Yamashita Mutsuo
Department Of Electronics Engineering
関連論文
- Electrical Conduction in Ti-TiO_2-Au Thin-Film Device
- Sputter Type HF Ion Source for Ion Beam Deposition Apparatus
- Characteristics of a Modified High Frequency Ion Source