Interface Structure of P-Type GaP/Au/Au-Zn
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概要
- 論文の詳細を見る
Studies on the microstructure of the GaP/Au/Au-Zn system were carried out with an electron microscope and X-ray energy spectrometer. It was shown that an AuGa layer was formed at the interface between GaP and the Au/Au-Zn layer, and that the AuGa reaction layer contained Zn atoms. It is considered that the AuGa layer may contribute to the mechanical strength of the deposit layer for wire bonding and reliable ohmic contact for a P-type GaP. The Au underlayer seems to promote the formation of the AuGa layer, which starts forming at 490℃.
- 社団法人応用物理学会の論文
- 1981-03-05
著者
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Komatsu Shuichi
Research And Development Center Toshiba Corporation
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Nakahashi Masako
Research And Development Center Toshiba Corporation
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KOIKE Yoshiyasu
Research and Development Center, Toshiba Corporation
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Koike Yoshiyasu
Research And Development Center Toshiba Corporation
関連論文
- Interface Structure of P-Type GaP/Au/Au-Zn
- Thermal Analysis of Phase Transformation in Metastable Au–Ge Films