Highly Resolved Maskless Patterning on InP by Focused Ion Beam Enhanced Wet Chemical Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-10-15
著者
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Forchel Alfred
Universitat Wirzburg Am Hubland
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Konig Harald
Universitat Wirzburg Am Hubland
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Reithmaier Johann
Universitat Wirzburg, Am Hubland
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Reithmaier J
Univ. Wuerzburg Wuerzburg Deu
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Forchel Alfred
Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
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Reithmaier Johann
Universität Würzburg, Am Hubland, D-97074 Würzburg, Germany
関連論文
- Highly Resolved Maskless Patterning on InP by Focused Ion Beam Enhanced Wet Chemical Etching
- Highly Resolved Maskless Patterning on InP by Focused Ion Beam Enhanced Wet Chemical Etching