Boron Vapour Phase Doping of Silicon for Bipolar Device Applications
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-10-15
著者
-
Theunissen M.j.j.
Philips Research Laboratories Prof. Holstlaan
-
Timmering C.E.
Philips Research Laboratories, Prof. Holstlaan
-
Van Berkum
Philips CFT-Materials Analysis, Prof.Holstlaan
-
Mergler Y.J.
Philips CFT-Materials Analysis, Prof.Holstlaan
-
Van Berkum
Philips Cft-materials Analysis Prof.holstlaan
-
Timmering C.e.
Philips Research Laboratories Prof. Holstlaan
-
Mergler Y.j.
Philips Cft-materials Analysis Prof.holstlaan
関連論文
- Substrate Damage Prevention and Simultaneous ZMR in Stacked SOI Layers : Semiconductors and Semiconductor Devices
- Boron Vapour Phase Doping of Silicon for Bipolar Device Applications