Effect of the Deposition Condition on Properties of a-Si : F : H Films : III-1: AMORPHOUS FILMS

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1982-12-20

著者

• ICHIMURA Takeshige

  Fuji Electric Corporate Research and Development, Lid.

• Uchida Yoshiyuki

  Fuji Electric Corporate Research And Development Ltd.

• Takeda Yukio

  Fuji Electric Corporate Research And Development Ltd.

• NABETA Osamu

  Fuji Electric Corporate Research and Development Ltd.

• HARUKI Hiromu

  Fuji Electric Corporate Research and Development Ltd.

• Ichimura Takeshige

  Fuji Electric Corporate Research And Development Ltd.

関連論文

• Subgap Absorption of Boron-Doped and Undoped a-SiC:H Detected by Photothermal Deflection Spectroscopy
• Hydrogenated Amorphous Silicon Germanium Alloys Prepared by Triode rf Glow Discharge
• The Role of Hydrogen in the Staebler-Wronski Effect of a-Si:H
• Application of Magnetic Energy Recovery Switch (MERS) to Improve Output Power of Wind Turbine Generators
• Effect of the Deposition Condition on Properties of a-Si : F : H Films : III-1: AMORPHOUS FILMS
• Microcrystalline Si: H Film and Its Application to Solar Cells

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