Microcrystalline Si: H Film and Its Application to Solar Cells
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概要
- 論文の詳細を見る
The photovoltaic performance of a new type amorphous silicon solar cell with ITO/n-i-p/ss solar cell in which phosphorus-doped microcrystalline (μc) Si: H is applied as the window-side layer is described in conjunction with the optical properties of the μc-Si: H film. By applying this film, the short-circuit current in the cell is improved over 10% in comparison with that of a conventional ITO/n-i-p/ss cell. This improvement is explained by the high transparency of the μc-Si: H and by a new concept of "double AR effect" of the crystallized window-side layer which reduces the surface reflectance.
- 社団法人応用物理学会の論文
- 1982-09-20
著者
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Uchida Yoshiyuki
Fuji Electric Corporate Research And Development Ltd.
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Ueno Masakazu
Fuji Electric Corporate Research And Development Ltd.
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HARUKI Hiromu
Fuji Electric Corporate Research and Development Ltd.
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Ichimura Takeshige
Fuji Electric Corporate Research And Development Ltd.
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- Microcrystalline Si: H Film and Its Application to Solar Cells