Low-frequency Low-noise Transistors Fabricated by Double Ion Implantation : A-1: ADVANCED LITHOGRAPHY AND PROCESS

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1980-04-30

著者

• Tokuyama T.

  Central Research Laboratory Hitachi Ltd.

• YAGI K.

  Central Research Laboratory, Hitachi Ltd.

• TAMURA M.

  Central Research Laboratory, Hitachi Ltd.

• YANAGI Y.

  Takasaki Works, Hitachi Ltd.

• INANIWA K.

  Takasaki Works, Hitachi Ltd.

• Inaniwa K.

  Takasaki Works Hitachi Ltd.

関連論文

• Microplasmas in Alloyed Germanium P-N Junctions
• Low-frequency Low-noise Transistors Fabricated by Double Ion Implantation : A-1: ADVANCED LITHOGRAPHY AND PROCESS
• Electrical Activation and Deep Diffusion of Ion-Implanted Al and Ga in Si : A-5: PROCESS TECHNOLOGY

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