Low-Dielectric-Constant-Film Deposition with Various Gases in a Helicon Plasma Reactor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-07-30
著者
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Chang H‐y
Korea Advanced Inst. Sci. And Technol. Taejon Kor
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Choi Chi-kyu
Department Of Physics Cheju National University
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Chang Hong-young
Department Of Physics Korea Advanced Institute Of Science And Technology
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Oh Kyoung-suk
Department Of Physics Cheju National University
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Yun Seok-Min
Department of Physics, Korea Advanced Institutes of Science and Technology
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Yun Seok-min
Department Of Physics Korea Advanced Institutes Of Science And Technology
関連論文
- Low-Dielectric-Constant-Film Deposition with Various Gases in a Helicon Plasma Reactor
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