Stress-Induced Leakage Current and Lateral Nonuniform Charge Generation in Thermal Oxides Subjected to Negative-Gate-Voltage Impulse Stressing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-04-30
著者
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Lim P
National Univ. Singapore Singapore
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LIM Peng
Centre for Integrated Circuit Failure Analysis and Reliability, Faculty of Engineering, National Uni
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CHIM Wai
Centre for Integrated Circuit Failure Analysis and Reliability, Faculty of Engineering, National Uni
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Chim Wai
Centre For Integrated Circuit Failure Analysis And Reliability Faculty Of Engineering National Unive
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Chim Wai
Centre For Integrated Circuit Failure Analysis And Reliability Faculty Of Engineering National Unive
関連論文
- Stress-Induced Leakage Current and Lateral Nonuniform Charge Generation in Thermal Oxides Subjected to Negative-Gate-Voltage Impulse Stressing
- Post-stress Dual-trap Interaction in Hot-carrier Stressed Submicrometer N-channel Metal-Oxide-Semiconductor Field-Effect-Transistors
- Neutral Electron Trap Generation and Hole Trapping in Thin Oxides under Electrostatic Discharge Stress