Fabrication of Photonic Crystals Consisting of Si Nanopillars by Plasma Etching Using Self-Formed Masks

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-12-30

著者

• Tada Tetsuya

  Joint Research Center For Atom Technology (jrcat) National Institute For Advanced Interdisciplinary

• POBORCHII Vladimir

  JRCAT-Angstrom Technology Partnership

• KANAYAMA Toshihiko

  JRCAT-Angstrom Technology Partnership

関連論文

• Scratch Lithography of 10 nm Silicon Structures
• Nanolithography Using Fullerene Films as an Electron Beam Resist
• Fabrication of Photonic Crystals Consisting of Si Nanopillars by Plasma Etching Using Self-Formed Masks
• Fabrication of Photonic Crystals Consisting of Si Nanopillars by Plasma Etching Using Self-Formed Masks

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