Stress Control and Etching Study of W-Re as X-Ray Mask Absorber

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-12-30

著者

• Sugihara S

  Toshiba Corp. Kawasaki Jpn

• SUGIHARA Shinji

  R&D Center, Toshiba Corporation

• MUROOKA Kenichi

  R&D Center, Toshiba Corporation

• ITOH Masamitsu

  R&D Center, Toshiba Corporation

• HIGASHIKAWA Iwao

  R&D Center, Toshiba Corporation

• GOMEI Yoshio

  R&D Center, Toshiba Corporation

• Gomei Yoshio

  R&d Center Toshiba Corporation

• Itoh Masamitsu

  R&d Center Toshiba Corporation

• Murooka Kenichi

  R&d Center Toshiba Corporation

• Sugihara Shinji

  R&d Center Toshiba Corporation

• Higashikawa Iwao

  R&d Center Toshiba Corporation

関連論文

• Stress Control and Etching Study of W-Re as X-Ray Mask Absorber
• Electronic Structures and Dielectric Properties of Substituted BaTiO_3
• Bi_2Te_3の電子構造とゼーベック係数
• Dielectric Property Change of Ferroelectrics and Electronic Structures

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